Material Preparation
Spin Coater
The Benchtop Spin Coater is a high-precision instrument designed for the uniform deposition of thin films on flat substrates. It utilizes controlled centrifugal force to spread coating materials, making it ideal for creating consistent layers of photoresists, polymers, and sol-gel solutions.
SC-6000
SC-8000
SC-PRO
Safety & Construction
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Safety lid with electronic interlock to prevent operation when open - Vacuum safety sensor to prevent spinning without substrate securement
- Compact benchtop design
Technical Specifications
Operational Parameters
- Rotation Speed 100 to 10,000 RPM (Model Dependent)
- Speed Accuracy < ±5% across the full range
- Substrate Size Up to 150 mm Diameter
- Chuck Type Vacuum Suction
- Acceleration Ramp Programmable: 100 to 5,000 RPM/sec
- Process Time 1 to 999 Seconds
- Power Supply 220V AC, 50Hz
variants
- SC-6000
Standard model for routine polymer and photoresist coating.
- SC-8000
High-speed variant for ultra-thin film deposition.
- SC-PRO
Advanced programmable model for multi-layer processing.
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Primary Applications
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Semiconductor Lithography
Uniform application of photoresists on silicon wafers.
Solar Cell Research
Fabrication of Perovskite and organic thin-film solar cells.
Nano-Coatings
Deposition of functional layers for sensors and microfluidics.
Let’s Discuss Your Requirements
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